photoetching
英[fəʊtə'ʊettʃɪŋ]
美[fəʊtə'ʊettʃɪŋ]
- 光刻法,光刻,光蚀刻,光刻蚀,照相腐蚀法
双语例句
- The invention discloses a method for determining the optimal object plane and the optimal image surface of a photoetching projecting device, and the relevant device thereof.
本发明公开了一种确定光刻投影装置最佳物面和最佳像面的方法及相关装置。
相关词汇
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